PERFORMANCE

 

 

 

|Overview|

PERFORMANCE

|Applications|

|Operation|

 

 

 

 For low k determinations, alternative approaches are generally slow and require either test wafers or risk contamination (e.g. Hg dots). Similarly, metal film analyses using resistivity measurements involving 4 point probes cause wafer damage. Metryx Mentor measures production wafers as standard, yet is sensitive enough to distinguish, for example, k variations from small changes in deposition parameters, or anneal state in Copper films not detectable by other methods. Metryx Mentor offers Low Cost of Ownership relative to competitive techniques.    
 
 

 

 

Accelerated Return on Investment

•On-Product-Wafer Mass Metrology measurement provides fast and effective process feedback

•By monitoring process performance with atomic level measurement capability for deposition and removal processes, Metryx metrology can provide a quick ROI