TECHNOLOGY OVERVIEW
All microelectronic devices are fabricated by adding or subtracting layers during the manufacturing process (Etch, Deposition, CMP etc.)Each process has a unique 'Mass Fingerprint'. By measuring the Mass change caused by each process and isolating it's Mass Fingerprint, it is possible to detect changes to the process by shifts in it's Mass Fingerprint.
Metryx technology provides a new generation of metrology tool based on innovative technology for materials development and SPC / 'Statistic Process Control'. The Metryx Mentor range of metrology equipment provides a family of reliable, low cost, high throughput, fully automatic mass determination with atomic layer repeatability.
- Metryx has fully automated 300mm in-line metrology systems running volume production in Fabs worldwide.
- Technology used is protected by internal patents
- Product designs comply with SEMI standards and industry standard components (e.g. Brooks robotics) and software protocols (e.g. Cimetrix) are used throughout.
- Metryx is a provider of nanotechnology metrology equipment.
- All microelectronic devices are manufactured by adding or removing materials. Unique technology from Metryx enables mass measurement, with atomic layer accuracy for characterization of individual materials and processes, or process control of the complete manufacturing sequence.
- The technology has been endorsed by major 200mm and 300mm Fabs worldwide.
- Multiple unit installations, running critical applications in fully automated production environments, have proven to be both reliable and cost effective.
- Key advantages include high throughput, low cost of ownership, independency of substrate, wafer size, wafer type and material.
- The measurement technique is also non-destructive and compatible with product, test and blanket wafers.