Press Release Archive
PRESS RELEASE ARCHIVE
Metryx wins Multi-System mentor Order from Research Consortium
BRISTOL, UK— July 17, 2007—Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has received orders from a major research consortium for its Mentor SF3 300 mm tool and Mentor OC23 200 mm tool. During the evaluation phase, the Mentor successfully identified previously undetected process trends, demonstrating the value mass metrology offers to the industry.
In the facility, the tools will be used to monitor a number of applications including shallow trench isolation, etch, deposition and CMP for both metal and dielectric layers. The Mentor demonstrated high enough throughput to be used as an inline metrology tool and because it is non-destructive it can be used directly on device wafers.
“These orders from an industry-leading R&D center clearly show the value-add mass metrology brings to semiconductor manufacturing,” explained Dr. Adrian Kiermasz, CEO of Metryx, Ltd. “So many processes have a measurable mass change and the Mentor’s versatility allows it to ensure process repeatability across a broad spectrum of manufacturing technologies. This makes it extremely valuable to semiconductor fabs, and in particular those working with novel processes or high product mix scenarios.”
Mentor Mass Metrology
The Mentor offers an innovative mass measurement technology that is able to measure any mass change resulting from a process change with atomic level accuracy.
The tool monitors the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap or preventing yield loss.
The Mentor offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughputs of 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.
Metryx mentor wins Semiconductor International's Editor's Choice Best Product 2007
BRISTOL, UK—July 2, 2007—Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it received the coveted Editor’s Choice Award for 2007 from leading industry magazine Semiconductor International. The award was given in recognition of Metryx’ Mentor mass metrology technology in a year that has seen Metryx revenues double based on growing acceptance on the company’s technology in the global semiconductor manufacturing industry. The award will be officially presented to Metryx on July 18th at an event during SEMICON West 2007, in San Francisco.
The Semiconductor International award marks the second distinguished award received by the company this year, having already been presented with the Queen’s Award for Enterprise, one of the most prestigious awards to be given in UK enterprise.
“A lot of people have put a great deal of effort into making this technology and this company a success. To receive awards such as these is great recognition for those efforts,” stated Adrian Kiermasz, president and CEO of Metryx, Ltd. “To succeed in this industry you need to offer a significant benefit in order to be adopted. We have always believed that our technology does just that and appreciate being recognized for what we bring to the industry.”
Metryx’ Mentor technology offers a unique measurement technology known as mass metrology. This approach utilizes innovative mass measurement technology, meaning it uses a series of very accurate force measurements and the mass change encountered during the process is measured to atomic level accuracy. The mass change is a direct consequence of the process change. Every process has a window of operation and hence a normal distribution of operation (± 3 sigma). The mass change has a corresponding normal distribution (± 3 sigma) that exactly correlates to the process. Should the process mean drift, or the process go outside its normal distribution, the mass change will also shift and the process can be corrected or stopped immediately saving scrap or preventing yield loss.
Mass metrology is used on actual product wafers as there absolutely is no front side intervention or intrusion, and in many cases measurement accuracies can be achieved to the sub-Ångström level. Mass change caused by process change correlates directly. Mass change represents the whole process, so that if anything changes in the process, mass change variation will pick it up and immediately provide information that the process is out of specification. Mass metrology is applicable to deposition, etch, and CMP processes, in fact, any device manufacturing process which involves a measurable mass change can be monitored and assessed using Mass metrology. It can also be used on dielectric and metal layers. Ultimately, the technology can reduce the use of test wafers, improve cycle time and increase yield.
Metryx Receives Queen's Award for Enterprise
BRISTOL, UK— May 23, 2007—Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has been honored with The Queen’s Award for Enterprise in the International Trade category.
It is the most prestigious award a company can win in the United Kingdom, earning it recognition as one of the most successful businesses in the country.
“As a company, we have experienced tremendous growth over the past six years due to the acceptance of our unique mass metrology technology,” stated Dr. Adrian Kiermasz, CEO of Metryx. “Being recognized with the Queen’s Award is a great honor for our company and confirms the progress we have made as a supplier to the to the global semiconductor manufacturing industry.”
The company started trading in 2000 and was selected for this Award for the first time based on its record of increasing its export sales by over 1,000 percent in three years. The company accomplished this by targeting leading-edge semiconductor manufacturers directly and through an international network of sales agents, as well as participating in trade shows and international conferences in its main markets in Asia, the USA and Europe.
Three separate ceremonies will be conducted to present the award. Representatives from Metryx received the first recognition in the presence of His Royal Highness, The Duke of York, at One Whitehall Place. The second takes place in July at Buckingham Palace in the presence of Her Royal Highness Queen Elizabeth. The third ceremony will take place with the Lord Lieutenant on the Metryx premises. Date and time information for this ceremony will be provided in the near future.
Metryx wins EuroAsia Semiconductor's IC Industry Startup of the Year Award 2007
BRISTOL, UK—July 2, 2007—Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has been honored as Start Up of the Year by EuroAsia Semiconductor magazine. The company was honored for its unique mass metrology technology as well as is strong business performance, having grown 1000 percent in 3 years.
The award follows on recent accolades for the company for Product of the Year from Semiconductor International as well as the prestigious Queen’s Award for Enterprise in the United Kingdom.
“This recognition serves as another acknowledgement of what Metryx brings to the semiconductor manufacturing industry, both in terms of a novel technology as well as the success of our business model,” stated Dr. Adrian Kiermasz, president and CEO of Metryx, Ltd. “Our strategic approach to growing the organization, including developments like our recent memorandum of understanding with Canon in Japan, combined with our internal focus on our core competencies, has allowed us to avoid many of the costs associated with the cyclical nature of the industry and achieve tremendous growth.
Metryx Enters Japanese Market in Cooperation with Canon Marketing Japan
BRISTOL, UK— May 15, 2007 — Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has signed a memorandum of understanding with Canon Marketing Japan (Canon MJ) to cooperatively market and promote Metryx’ Mentor mass metrology products to leading Japanese semiconductor manufacturers.
Metryx’ cooperation with Canon MJ is another significant step in the company’s increasing focus on the Asia-Pacific region. Due to the growing acceptance and adoption of Mentor technology in the region, the company recently increased its own business development capabilities with the hiring of Gary Ditmer as Asia Business Director, based in Japan.
“Finding the right local partner in Japan is of paramount importance when entering the market,” stated Adrian Kiermasz, President and CEO of Metryx. “Working in coordination with Canon MJ, we have established the best possible scenario. Along with our recent regional management hires, this is yet another key part of the puzzle we now have in place to give ourselves and our technology the best platform for successful adoption in the global chip manufacturing business.”
“The Mentor technology has proven successful in advanced technology nodes in both 200 and 300mm production,” said Gary Ditmer, Asia Business Director for Metryx. “Japan is home to a number of the industry’s technology leaders, particularly in 300mm volume production, including logic, flash, and DRAM activities. Together with Canon MJ, we look forward to exploiting the opportunities that exist for our technology in Japan.”
The Mentor’s capabilities are proven for any device manufacturing process that involves a measurable mass change, including deposition, etch, and CMP processes; and has been implemented successfully for measurement of low-k, high-k gate and silicon etch applications. Mass metrology is performed on actual product wafers as there is absolutely no front side intervention or intrusions, enabling users to reduce the use of test wafers, improve cycle time and increase yield.
Metryx Expands Global Infrastructure to meet Growing Demand for Mass Metrology
BRISTOL, UK— April 11, 2007—Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced the hiring of two new directors of business development. Mark Berry has been appointed North America and Europe Business Director while Gary Ditmer has joined Metryx as Asia Business Director in a move to support the company’s increasing global business development activities. In addition, Liam Cunnane, previously North American Director of Technology, has been promoted to Worldwide Technology Director.
“We are at a stage now where we need to ramp up our internal capability in order to meet the growing acceptance of our mass metrology technology,” stated Adrian Kiermasz, CEO of Metryx, Ltd. “Both Mark and Gary represent a significant win for us. We have been able to recruit two excellent employees who have extensive experience in the semiconductor industry. As we grow, both of their roles will be critical to the company, helping to increase our installed base and concurrently develop our service capability on a global level.”
Mark Berry joined Metryx in April 2007, joining the company from Veeco where he held positions of increasing responsibility throughout his tenure, including Vice President of Sales for Veeco’s compound semiconductor division. Prior to his time at Veeco, Berry also held sales and market development positions with Oxford Instruments Plasma Technology.
Gary Ditmer joined the company in January, 2007. Based in Japan, Ditmer has extensive business experience in the Far East and has held key sales positions with Oxford Instruments Plasma Technology and Applied Materials. Ditmer holds a B.S. in chemical engineering from the Massachusetts Institute of Technology.
Metryx Receives Mass Metrology Production Tool Order from Key US GaAs Manufacturer
BRISTOL, UK—December 14, 2006—Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that a leading US-based GaAs volume manufacturer of SAW and BAW devices for the communications industry, has placed an order for the company’s Mentor OC23 Mass Metrology system. The GaAs manufacturer plans to use the OC23 in a volume production, measuring both deposition and etch processes on product wafers.
The order highlights the broad range of applications where mass metrology can be implemented to monitor and characterize processes. Metryx technology can be used to monitor product wafers in volume production environments for dielectric and conducting materials in etch, deposition and CMP process applications.
“We continue to see increasing interest in our unique mass metrology systems from a wide variety of manufacturers,” stated Dr. Adrian Kiermasz, President and CEO of Metryx. “Because the Mentor offers a non-interfering in-line approach and is not dependant on the substrate it can be implemented across the full spectrum of manufacturing technologies. By allowing manufacturers to identify changes in process performance on a wafer-to-wafer basis any potential issues can be quickly addressed to save considerable time and money.”
Capable of measuring in the microgram range (approximately one Angstrom of material thickness), the in-line Mentor OC23 tool monitors the mass change of any wafer following a process step, to quickly determine whether device manufacture process steps are operating consistently and in the expected manner. The mass change response for the process step is managed like other SPC parameters in the process flow.
The small-footprint Mentor OC23 tool is capable of throughputs of 60 wafers per hour to enable nanotechnology mass measurement of product, test and blanket wafers independent of substrate size or material. In this configuration, dual open cassettes utilizing wafers up to 200mm may be used. After measurements have been completed on one cassette the tool can immediately start to measure the other one without waiting for operator intervention. Alternatively, a single 13 wafer 300mm Open Cassette may be placed centrally on the top plate. Metryx also offers 300 mm FOUP configurations within the Mentor line of products.
September 2006 - Metryx Wins New Orders for its Mass Metrology Production Tools
Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, announced today that it has received orders from three new customers for its innovative mass metrology Mentor™ technology. The tools will be deployed in volume production environments to provide process control for a variety of applications.
The orders were received from three different semiconductor manufacturers, one each from Asia, Europe and North America. All three placed orders for Mentor SF3 tools, which are capable of measuring errors in the microgram range.
“More production orders from new customers is simply further validation for our technology," stated Dr Adrian Kiermasz, President and CEO of Metryx. “Our non-intrusive in-line measuring tools deliver exceptional early warning process control and the accompanying peace of mind that the process is working as it should. There is a great deal of interest in this technology, which is increasingly bringing additional business from both new and existing customers.”
“Investment in process diagnostic equipment by chip makers is currently running at the rate of around $4 billion,” stated John West, Principal Analyst at VLSI Research, Europe. “Any technology which is able to provide a simple, straightforward solution is going to be a welcome addition to a field that is characterized by tools that are often expensive and difficult to use.”
Designed for monitoring critical semiconductor device manufacturing process steps on product wafers in a variety of applications, including memory, logic and power components, Metryx’s Mentor SF3 is a 300mm mass metrology tool offering atomic level repeatability, low cost of ownership and high return on investment.
The Mentor SF3 tool monitors the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC) and normal distribution analysis. The tool allows process changes to be reliably and accurately determined after deposition, wet or dry etch, or CMP processing.
“We have designed a simple, cost-effective way of measuring whether or not a process is depositing or taking away the material it is supposed to during each respective process step. Semiconductor manufacturers worldwide are now reaping the rewards of this elegant technology as valuable time and money is saved by simply understanding the mass fingerprint of a wafer after every process step," added Dr. Kiermasz.
The small-footprint Mentor SF3 tool is capable of throughputs of 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.
March 2006 - Elton Peace of LAM Research Joins Metryx Advisory Board
Metryx is delighted to announce that Elton Peace is joining its Advisory Board of Directors.
Elton has 23 years’ experience in the semiconductor manufacturing industry and has worked at Lam Research for 13 years. He currently runs Lam’s North America Regional Account business.
Asked for his reasons for becoming part of the Metryx advisory team, Elton comments: "Metryx has a truly unique measurement technology and offers production solutions to metrology problems which cannot be solved by any other techniques. I am thrilled to be able to offer my assistance and experience to what I believe will be a very successful company."
Metryx manufactures nanotechnology weight metrology systems for fundamental film property assessment and statistical process control.
